On the afternoon of May 25th, 2023, the Academic Year Farewell Party for IAS Fellows was successfully conducted in the Common Room of the Cultural Building. The purpose of this event was to formally acknowledge and celebrate the exceptional contributions made by the IAS Fellows throughout the academic year. Esteemed guests, including Professor Yu Xingzhong, Professor Wang Di, Professor Shui Bing, Professor Lin Shaoyang, Professor João Veloso, Professor Wang Qingjie, Professor Sun Yifeng, Professor Zhang Yue, Professor Liu Jianhong, Professor João Ilhão Moreira, and Professor Xu Jianhua, were cordially invited to attend the reception.
At the commencement of the gathering, Professor Yu, the Director of IAS, delivered a brief overview of the challenges and achievements encountered by IAS during the preceding year. He expressed heartfelt gratitude for the unwavering support and invaluable contributions rendered by all IAS Fellows. Professor Yu acknowledged that 2022 presented formidable trials, such as the pandemic’s profound impact and staffing change, both of which posed significant hurdles for IAS. Nonetheless, with the integration of numerous new leaders and members, who have demonstrated active engagement in preparing forthcoming projects, the onset of the 2023 academic year signifies a fresh start. Professor Yu conveyed his unwavering optimism that IAS is poised to accomplish even greater heights in the ensuing year.
The farewell party fostered an ambience of relaxation and camaraderie, stimulating professors to enthusiastically share their experiences of working at IAS. Being a Fellow at IAS provided abundant opportunities for interdisciplinary exchanges and intellectual collisions. Several professors expressed their fervent anticipation for the upcoming IAS activities in the forthcoming academic year, eagerly awaiting the exciting thematic presentations to be delivered by their esteemed colleagues. They reaffirmed their complete confidence in IAS and vowed to continue supporting its ongoing development with utmost dedication and diligence.
